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The principle of vacuum coating machine and analysis of its components
The principle of vacuum coating machine and analysis of its components
Vacuum coating machine is currently the most widely used vacuum equipment for producing vacuum conditions. It is generally composed of three parts: vacuum chamber, vacuum unit and electrical control cabinet. The exhaust system adopts "diffusion pump + mechanical pump + roots pump + cryogenic cold trap + polycold" composition. The company specializes in the development and production of vacuum coating equipment. It has an experienced technical team and a high-quality after-sales service team to solve any problems encountered during the use of the equipment. Below, the composition and working principle of each part of the vacuum coating machine are introduced in detail.
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Vacuum coating machine is currently the most widely used vacuum equipment for producing vacuum conditions. It is generally composed of three parts: vacuum chamber, vacuum unit and electrical control cabinet. The exhaust system adopts "diffusion pump + mechanical pump + roots pump + cryogenic cold trap + polycold" composition. The company specializes in the development and production of vacuum coating equipment. It has an experienced technical team and a high-quality after-sales service team to solve any problems encountered during the use of the equipment. Below, the composition and working principle of each part of the vacuum coating machine are introduced in detail.
Design method of film thickness uniformity of magnetron sputtering coating
Design method of film thickness uniformity of magnetron sputtering coating
Magnetron sputtering coating is one of the indispensable technologies in modern industry. Magnetron sputtering coating technology is widely used in transparent conductive film, optical film, super hard film, anti-corrosion film, magnetic film, antireflection film, anti-reflection Films and various decorative films are playing an increasingly powerful role in national defense and national economic production. The problems of film thickness uniformity, deposition rate, and target utilization rate in the coating process are of great concern in actual production. The way to solve these practical problems is to optimize the design of all factors involved in the sputtering deposition process, and establish a comprehensive design system for sputtering coating. The uniformity of film thickness is one of the most important parameters for testing the sputtering deposition process, so the research on the comprehensive design of film thickness uniformity has important theoretical and application value.
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Magnetron sputtering coating is one of the indispensable technologies in modern industry. Magnetron sputtering coating technology is widely used in transparent conductive film, optical film, super hard film, anti-corrosion film, magnetic film, antireflection film, anti-reflection Films and various decorative films are playing an increasingly powerful role in national defense and national economic production. The problems of film thickness uniformity, deposition rate, and target utilization rate in the coating process are of great concern in actual production. The way to solve these practical problems is to optimize the design of all factors involved in the sputtering deposition process, and establish a comprehensive design system for sputtering coating. The uniformity of film thickness is one of the most important parameters for testing the sputtering deposition process, so the research on the comprehensive design of film thickness uniformity has important theoretical and application value.
The role of vacuum coating
The role of vacuum coating
Time of issue : 2020-03-05 13:40:31
Vacuum coating is mainly to reduce reflection. In order to improve the light transmittance of the lens and the quality of the image, the lens must be vacuum coated in the modern lens manufacturing process. The vacuum coating of the lens is based on the principle of optical interference. The surface of the lens is coated with a quarter-wavelength substance (usually fluoride) to minimize the reflection of the colored light of this wavelength. Obviously, a layer of film only works on one color light, while a multilayer vacuum coating film can work on multiple colors.
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Vacuum coating is mainly to reduce reflection. In order to improve the light transmittance of the lens and the quality of the image, the lens must be vacuum coated in the modern lens manufacturing process. The vacuum coating of the lens is based on the principle of optical interference. The surface of the lens is coated with a quarter-wavelength substance (usually fluoride) to minimize the reflection of the colored light of this wavelength. Obviously, a layer of film only works on one color light, while a multilayer vacuum coating film can work on multiple colors.
New progress and development trend forecast of magnetron sputtering coating technology
New progress and development trend forecast of magnetron sputtering coating technology
The basic process of glow plasma sputtering is that the target material of the negative electrode is sputtered from the target material under the action of the energetic ions in the glow plasma located on it, and then condenses on the substrate to form a thin film; During this process, the target surface emits secondary electrons at the same time, and these electrons play a key role in keeping the plasma stable. The emergence and application of sputtering technology has gone through many stages. At first, it was just a simple two-pole and three-pole discharge sputtering deposition; after more than 30 years of development, magnetron sputtering technology has developed into the preparation of super hard, wear-resistant, low-temperature An irreplaceable method for functional films such as friction coefficient, corrosion resistance, decoration, and optics and electricity.
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The basic process of glow plasma sputtering is that the target material of the negative electrode is sputtered from the target material under the action of the energetic ions in the glow plasma located on it, and then condenses on the substrate to form a thin film; During this process, the target surface emits secondary electrons at the same time, and these electrons play a key role in keeping the plasma stable. The emergence and application of sputtering technology has gone through many stages. At first, it was just a simple two-pole and three-pole discharge sputtering deposition; after more than 30 years of development, magnetron sputtering technology has developed into the preparation of super hard, wear-resistant, low-temperature An irreplaceable method for functional films such as friction coefficient, corrosion resistance, decoration, and optics and electricity.

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