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Design method of film thickness uniformity of magnetron sputtering coating

Design method of film thickness uniformity of magnetron sputtering coating

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  • Time of issue:2020-12-11 15:07
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(Summary description)Magnetron sputtering coating is one of the indispensable technologies in modern industry. Magnetron sputtering coating technology is widely used in transparent conductive film, optical film, super hard film, anti-corrosion film, magnetic film, antireflection film, anti-reflection Films and various decorative films are playing an increasingly powerful role in national defense and national economic production. The problems of film thickness uniformity, deposition rate, and target utilization rate in the coating process are of great concern in actual production. The way to solve these practical problems is to optimize the design of all factors involved in the sputtering deposition process, and establish a comprehensive design system for sputtering coating. The uniformity of film thickness is one of the most important parameters for testing the sputtering deposition process, so the research on the comprehensive design of film thickness uniformity has important theoretical and application value.

Design method of film thickness uniformity of magnetron sputtering coating

(Summary description)Magnetron sputtering coating is one of the indispensable technologies in modern industry. Magnetron sputtering coating technology is widely used in transparent conductive film, optical film, super hard film, anti-corrosion film, magnetic film, antireflection film, anti-reflection Films and various decorative films are playing an increasingly powerful role in national defense and national economic production. The problems of film thickness uniformity, deposition rate, and target utilization rate in the coating process are of great concern in actual production. The way to solve these practical problems is to optimize the design of all factors involved in the sputtering deposition process, and establish a comprehensive design system for sputtering coating. The uniformity of film thickness is one of the most important parameters for testing the sputtering deposition process, so the research on the comprehensive design of film thickness uniformity has important theoretical and application value.

  • Categories:news
  • Author:
  • Origin:
  • Time of issue:2020-12-11 15:07
  • Views:
Information

Magnetron sputtering coating is one of the indispensable technologies in modern industry. Magnetron sputtering coating technology is widely used in transparent conductive film, optical film, super hard film, anti-corrosion film, magnetic film, antireflection film, anti-reflection Films and various decorative films are playing an increasingly powerful role in national defense and national economic production. The problems of film thickness uniformity, deposition rate, and target utilization rate in the coating process are of great concern in actual production. The way to solve these practical problems is to optimize the design of all factors involved in the sputtering deposition process, and establish a comprehensive design system for sputtering coating. The uniformity of film thickness is one of the most important parameters for testing the sputtering deposition process, so the research on the comprehensive design of film thickness uniformity has important theoretical and application value.

  In the development of magnetron sputtering technology, various technological breakthroughs generally focus on the generation of plasma and the control of plasma. Through the control of electromagnetic field, temperature field and the distribution parameters of different kinds of particles in space, the quality and properties of the film can meet the requirements of various industries.

The uniformity of the film thickness is closely related to the working state of the magnetron sputtering target, such as the etching state of the target, the electromagnetic field setting of the target, etc. Therefore, in order to ensure the uniformity of the film thickness, foreign film preparation companies or coating equipment manufacturing companies have Respective complete design schemes for coating equipment (including the core component "target"). At the same time, there are many companies that specialize in target analysis, design and manufacturing, and develop related application design software to optimize equipment design according to customer requirements. There is still a big gap between the analysis and design of coating equipment in China and the international advanced level.

   Therefore, it is imperative to establish a comprehensive design system for sputtering coating. The establishment of the system can be carried out from the overall comprehensive design to the partial design, and then from the partial design to the overall comprehensive design, that is, the dynamic design concept of "whole to part and then to the whole" to continuously improve the design system. Enumerate the important factors involved in sputtering coating, find out the internal connection between them, and then establish a comprehensive sputtering coating design system, on this basis, conduct the film thickness uniformity research, and make the later conversion into the design system software Pave the way to prepare a large-area film with good film uniformity and provide a strong guarantee for production.

  1, design system properties

  The uniformity of sputtering coating film thickness is one of the final standards to indirectly measure the coating process, which involves all aspects of the coating process. Therefore, the preparation of high-quality films with good film thickness uniformity requires the establishment of a comprehensive design system for sputtering film thickness uniformity, classifying, summarizing and summarizing all aspects of sputtering filming, and finding out their internal connections. Generally speaking, the establishment of a design system should have certain principles to determine its basic organizational framework. The following describes its nature from four aspects: ①Generality: The system is required to be applicable or universal in a certain range. For this subject, the system can meet the basic process requirements of industrial flat substrate sputtering coating, that is, the common problems of sputtering coating process. ②Particularity: the system achieves the best applicability to specific research objects. For large-area flat substrate sputtering coating, the size effect in sputtering coating becomes an important part of the system, such as film uniformity, substrate heating uniformity, linear expansion and deformation of materials, current distribution on the target surface, Gas distribution and electromagnetic field distribution, etc. This series of problems is highlighted by the size effect. Therefore, the size effect becomes a system's personality problem. ③Openness: All parts of the system are organically combined and developed continuously. With the advancement of technology, the functions of each part will inevitably be further developed, so that the comprehensive performance of the system will be improved. The development of automatic control technology has made the function of the system powerful: the monitoring technology of the plasma spectrum during the sputtering process and the ability to manipulate the electromagnetic field enable the system to control the parameters of the entire sputtering process to the maximum extent, enabling fine design . The openness of the system belongs to horizontal development. ④ Inheritance: When the system develops to a certain extent, a process from quantitative change to qualitative change will occur. The system continues to improve and improve on the basis of Baowang's original functions. Film preparation technology will gradually deepen with the development of theory. The theoretical research on unbalanced magnetron sputtering and plasma has promoted the further development of sputtering technology. What follows is to upgrade the system to achieve new functions. Inheritance is the vertical development of the system.

  2, the establishment of the design system

  In general, the enhancement of a part of the system will bring about the enhancement of the overall function, while reducing the system's dependence on some parts, or it can be understood as: the two necessary factors of the system are organically combined into one part. Establishing a comprehensive design system helps to study the internal logical relationships of each part of the system.

  The large-area sputtering coating comprehensive design system can be divided into three parts: the T process design of the coating equipment, the design of the coating process and the computer numerical simulation design of each process, refer to Figure 1. Each part is divided into several aspects, and the parts influence each other. Because the system is more complex, the initial stage of the establishment of the system should try to simplify the design parameters to improve its practicability.

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