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DE200 pulsed laser thin film deposition system
DE200脉冲激光薄膜沉积系统011
DE200脉冲激光薄膜沉积系统011

DE200 pulsed laser thin film deposition system

Stainless steel cavity, equipped with molecular pump, ion pump or condensate pump and dry pump and corresponding valves, full range vacuum gauge, multi-target automatic positioning, laser, PLC and industrial computer control

Configuration and overview:
Stainless steel cavity, equipped with molecular pump, ion pump or condensate pump and dry pump and corresponding valves, full range vacuum gauge, multi-target automatic positioning, laser, PLC and industrial computer control

Equipment options:
      The substrate can be up to 4 inches
      The substrate can be heated to 950 degrees
      The substrate can be TILT
      The substrate can be rotated
      RHEED
      source of ion
      LOAD LOCK
      STM
      Vacuum interconnection or vacuum robot substrate transfer

Features:
      High vacuum or ultra-high vacuum
      Vacuum quickly
      Fully automatic control
      Use preferred components
      Thoughtful after-sales service

Equipment used in:
      Used for film deposition of superlattices, quantum devices, superconductors, semiconductors, nano devices, optoelectronics, biological and other materials, etc.

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