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DE500DL Magnetron Sputtering System
DE500磁控溅射薄膜沉积系统002
DE500磁控溅射薄膜沉积系统002

DE500DL Magnetron Sputtering System

DE500DL magnetron sputtering system is assembled with multi magnetron sputtering sources for deposition metals, semiconductor, insulation materials on the up to 6 inch substrate, it can be used to sputter multilayer thin film or co-sputter for alloy thin film. It is the ideal tools for thin film R&D for the university and academy.

DE500DL magnetron sputtering system is assembled with multi magnetron sputtering sources for deposition metals, semiconductor, insulation materials on the up to 6 inch substrate, it can be used to sputter multilayer thin film or co-sputter for alloy thin film. It is the ideal tools for thin film R&D for the university and academy.

Features

Sputtering Deposition Chamber with front open door for easy inside service

PID downstream and upstream pressure control
Good Film Uniformity and repeatability
Safety interlock for critical components

 

 

 

 

 

 

Configuration

Magnetron Sputter Chamber

304L stainless steel chamber with viewport

Vacuum Pumping

Turbo-pump (or Cryopump) and dry pump

Vacuum Valve

High vacuum gate valves

Chamber Vent Valve, Rough and Foreline angle valve, and gas valve

Vacuum Gauging

Wide range vacuum gauge and Pirani rough gauge

Sputtering Sources

 

Up to four 3" or 4" circle magnetron sputtering sources

The power supply can be DC, pulse DC or RF power supply

Sample Stage

Substrate rotating and heating or cooling

Pressure Control

Multiple channel Mass flow controller

Capacitance manometer for sputter process pressure PID control

Cooled Water Interlock

Cooling water flow sensors of interlock to protect sputter sources work properly

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Specification

The Base Vacuum Pressure in Sputter Chamber

Better than 3E-8 Torr

Sample Loading Capacity

Max. 6 inch flat substrate

The Max. Temperature of the Sample Heater

600C (option 900C)

The film uniformity

Better than +/-3% over 6 inch Silicon wafer

General Sputtering Pressure

1-50mTorr

Product description

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