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DE400BHL E-beam Evaporation System
微信图片_20231013141848
微信图片_20231013141848

DE400BHL E-beam Evaporation System

DE400BHL electron beam evaporation system is assembled with a evaporation sources for deposition metal such as Pd, Ti, Al, Au, Pt, Nb or some oxide materials on the up to 2" substrate, and it's assembled with worldwide well known components, the configuration/specification.

DE400BHL electron beam evaporation system is assembled with a evaporation sources for deposition metal such as Pd, Ti, Al, Au, Pt, Nb or some oxide materials on the up to 2" substrate, and it's assembled with worldwide well known components, the configuration/specification. 

 

Features

>  Unique Design of Substrate Chamber and Sources chamber isolated by UHV gate valve

>  All Metal Seal, True UHV System 

>  Stand along system frameworks and electric rack

>  E-beam source Water Interlock 

>  Optional Substrate Cooling

 

Configuration

Evaporation Chamber

304 stainless steel chamber with viewport

Vacuum Pumping

Cryo-pump or Turbo pump and dry rough pump

Vacuum Valve

Pneumatic UHV gate valves

Evaporation Source

Multi pocket e-beam source

Substrate Chamber

304 stainless steel chamber with viewport

Sample Stage 

Side mount polar Substrate

Film Control

Crystal Film thickness Monitor and Control 

Vacuum Gauging

Wide range vacuum gauge and rough gauge

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Specification

The Base Vacuum Pressure

better than 9.5E-9 Torr

Sample Loading Capacity

One Max. 2 inch flat substrate

Rate Resolution

0.05 Angstroms/sec

Thickness Resolution = 0.02 Angstroms

0.02 Angstroms

Product description

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