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DE400CHL E-beam Evaporation System
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DE400CHL E-beam Evaporation System

DE400CHL Electron Beam Evaporation System is assembled with one e-beam source of multiple crucible  for deposition metals, semiconductor, insulation materials on the up to 6 inch substrate, and it is assembled with worldwide well known components, the configuration / specification as per following description

DE400CHL Electron Beam Evaporation System is assembled with one e-beam source of multiple crucible  for deposition metals, semiconductor, insulation materials on the up to 6 inch substrate, and it is assembled with worldwide well known components, the configuration / specification as per following description:

Configuration

Evaporation Chamber 304 stainless steel chamber with viewport
Vacuum Pumping

Oxford cryo pump of 10" OD CF flange

1500L/s pumping speed

The base vacuum pressure of chamber:better than 7E-9Torr (clean, dry and empty condition)
Vacuum Valve VAT High vacuum Gate valve, stainless steel, pneumatic actuation, 10”OD CF flange
Chamber rough pumping valve, stainless steel, high vacuum, pneumatic actuation
Stainless steel bellow/hose connectionv
Swagelok Pneumatic actuation valve for chamber vent
Evaporation Source HCR series rotary EIGHT (8) pocket E-BEAM source with 7cc crucibles
Optional Load Lock chamber 304 stainless steel chamber with viewport
Sample Stage Top mount and rotary or Side mount polar Substrate
Film Control Crystal Film thickness Monitor and Control 
Vacuum Gauging Wide range vacuum gauge and rough gauge

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Specification

The Base Vacuum Pressure

better than 7E-9Torr (clean, dry and empty condition)

Sample Loading Capacity

One Max. 8 inch flat substrate or multi small substrate

Rate Resolution

0.01 Angstroms/sec

Thickness Resolution = 0.02 Angstroms

0.1 Angstroms

Product description

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