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DE400 Electron Beam Evaporator
DE500磁控溅射薄膜沉积系统002
DE500磁控溅射薄膜沉积系统002

DE400 Electron Beam Evaporator

The DE400 Electron Beam Evaporator is assembled with one e-beam source,  the substrate is mounting on the horizontal axial on the side of chamber for the substrate polar to change the deposition angle.

 

Features

>  Unique Design of Substrate Chamber and Sources chamber isolated by UHV gate valve

>  All Metal Seal, True UHV System 

>  Stand along system frameworks and electric rack

>  E-beam source Water Interlock 

>  Optional Substrate Cooling

 

Configuration

Evaporation Chamber

304 stainless steel chamber with viewport

Vacuum Pumping

Cryo-pump or Turbo pump and dry rough pump

Vacuum Valve

Pneumatic UHV gate valves

Evaporation Source

Multi pocket e-beam source

Substrate Chamber

304 stainless steel chamber with viewport

Sample Stage 

Side mount polar Substrate

Film Control

Crystal Film thickness Monitor and Control 

Vacuum Gauging

Wide range vacuum gauge and rough gauge

 

 

 

 

 

 

 

 

 

 

 

 

 

Specification

The Base Vacuum Pressure

better than 9E-9 Torr

Sample Loading Capacity

One Max. 4 inch flat substrate

Rate Resolution

0.05 Angstroms/sec

Thickness Resolution = 0.02 Angstroms

0.02 Angstroms

Product description

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