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DE400D Thermal Evaporation System
DE400中山大学-新机架小图
DE400中山大学-新机架小图

DE400D Thermal Evaporation System

The DE400D Thermal Evaporator is assembled with multiple thermal evaporation source, the substrate is mounting on the top of the chamber and rotary or on the horizontal axial on the side of chamber for the substrate polar to change the deposition angle.

The DE400D Thermal Evaporator is assembled with multiple thermal evaporation source, the substrate is mounting on the top of the chamber and rotary or on the horizontal axial on the side of chamber for the substrate polar to change the deposition angle.

Features

>  D shape Chamber of front open door for easy inside operation 

>  Stand along system frameworks and electric rack

>  The deposition process can be accurately controlled by source temperatureor film thickness control

>  Optional Substrate Cooling or heating 

 

Configuration

Evaporation Chamber

304 stainless steel chamber with viewport

Vacuum Pumping

Cryo-pump or Turbo pump and dry rough pump

Vacuum Valve

Pneumatic HV gate valves

Evaporation Source

Multiple thermal evaporation source

Optional Load Lock chamber

304 stainless steel chamber with viewport

Sample Stage 

Top mount and rotary or Side mount polar Substrate

Film Control

Crystal Film thickness Monitor and Control 

Vacuum Gauging

Wide range vacuum gauge and rough gauge

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Specification

The Base Vacuum Pressure

Better than 3E-8 Torr

Sample Loading Capacity

One Max. 8 inch flat substrate or multi small substrate

Max. Evaporation Temperature

2732°F

Rate Resolution

0.05 Angstroms/sec

Thickness Resolution = 0.02 Angstroms

0.02 Angstroms

Product description

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德仪科技