Beijing Deyi Tianli Technology Development Co., Ltd.

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DE400DL Thermal Resistance Evaporation Thin Film Deposition System

DE400DL thermal resistance evaporator can be equipped with multiple sets of evaporation sources, sample delivery chamber, continuously rotating sample table or tiltable sample table

Features

The front door of the cavity is open to facilitate the operation and maintenance of the cavity

Separate system rack and electrical cabinet

The film deposition process can be accurately controlled by the temperature, but also through the film thickness meter accurate control rate

Selectable Tilt and Rotary Substrate Table

Sample table optional water cooling or heating

Optional glove box

Typical applications

For thin film deposition R & D

Ideal platform for LIFT-OFF process

Evaporatable metals, semiconductors, dielectric materials or organic materials

Main Configuration

Vacuum pump	Equipped with condensate pump or molecular pump and oil-free mechanical pump
Vacuum valve	Pneumatic control high vacuum valve
evaporation source	multi-group thermal evaporation source
Sample Room	The evaporation chamber is made of 304 stainless steel and has an observation window.
Sample table	Continuously rotating sample stage or tiltable sample stage
Film thickness detection	Crystal Oscillator Film Thickness Monitoring
Vacuum measurement	Wide range vacuum gauge for measuring vacuum and rough draw gauge
Pre-vacuum sample chamber	Single or multiple substrate loading capability Automatic sample delivery

Main technical indicators

ultimate vacuum degree	Better than 5E-8Torr
Substrate Size	Optional: 2 inches, 4 inches, 6 inches, 8 inches, 12 inches
film thickness uniformity	Better than +/-3%
Evaporation rate resolution	0.01 A/s
Film thickness resolution	0.1 A