DE400 Thermal Resistance Evaporation Thin Film Deposition System
DE400 thermal resistance evaporator can be configured with multiple evaporation sources, continuously rotating sample stage or tiltable rotating sample stage.
| Features |
The front door of the cavity is open to facilitate the operation and maintenance of the cavity Separate system rack and electrical cabinet The film deposition process can be accurately controlled by the temperature, but also through the film thickness meter accurate control rate Selectable Tilt and Rotary Substrate Table Sample table optional water cooling or heating Optional glove box |
| Typical applications |
For thin film deposition R & D Ideal platform for LIFT-OFF process Evaporatable metals, semiconductors, dielectric materials or organic materials |
Main Configuration
| Vacuum pump | Equipped with condensate pump or molecular pump and oil-free mechanical pump |
| Vacuum valve | Pneumatic control high vacuum valve |
| evaporation source | multi-group thermal evaporation source |
| Sample table | Continuously rotating sample stage or tiltable sample stage |
| Film thickness detection | Crystal Oscillator Film Thickness Monitoring |
| Vacuum measurement | Wide range vacuum gauge for measuring vacuum and rough draw gauge |
Main technical indicators
| ultimate vacuum degree | Better than 5E-7Torr |
| Substrate Size | Optional: 2 inches, 4 inches, 6 inches, 8 inches, 12 inches |
| film thickness uniformity | Better than +/-3% |
| Evaporation rate resolution | 0.01 A/s |
| Film thickness resolution | 0.1 A |
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