Beijing Deyi Tianli Technology Development Co., Ltd.

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DE500DL superconducting quantum magnetron sputtering system

DE500DL superconducting quantum magnetron sputtering system is equipped with multiple magnetron sputtering sources, which can deposit metal, semiconductor and dielectric materials. It can be used for sputtering multilayer films, co-sputtering alloy films, reactive sputtering, LIFT-OFFProcess films, tunnel junction films, etc. It is an ideal platform for materials and thin film deposition research and development and pilot testing.

Features

Sputtering coating cavity rubber ring seal before opening the door for internal operation
Sputtering distance adjustable
PID downstream and upstream pressure control
Good film uniformity and repeatability
Safety interlock protection
PLCAnd industrial control automatic control
Optional ion beam cleaning or assisted deposition
Optional RF plasma cleaning,Optional wedge film

Main Configuration

coating chamber	The cavity is made of 304 stainless steel and has a viewing window.
Vacuum pump	Molecular pumps (or condensate pumps) and dry pumps
Vacuum valve	High vacuum board valve Cavity charge valve, roughing or pre-valve, gas control valve
Vacuum measurement	Wide range vacuum gauge and Pirani rough gauge
sputtering source	Multiple Sputtering Sources DC, Pulsed DC, RF Power Supplies
Sample table	Rotary heating or cooling of sample stage
Gas and pressure control	Multi-gas flow meter PID control pressure control
Pre-vacuum sample chamber	Single or multiple substrate loading capability Automatic sample delivery

Main technical indicators

Limit vacuum degree of coating chamber	Better than 9E-9Torr
Substrate Size	Optional: 2 inches, 4 inches, 6 inches
Substrate Heating and Cooling	Can be heated to 900 ℃ and cooled to -50 ℃, the substrate can rotate High temperature preparation of superconducting material films and low temperature preparation of superconducting material films
film thickness uniformity	Better than +/-3%