Beijing Deyi Tianli Technology Development Co., Ltd.

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DE600CL multi-electron gun evaporation coating system

DE600CL multi-electron gun evaporation coating system is equipped with three (four or six) electron beam evaporation sources, which can co-evaporate metal, semiconductor or dielectric materials on the substrate.

Features

Open the door before the rubber ring of the evaporation cavity is sealed to facilitate the operation inside the cavity.

The opening of the substrate baffle is controlled by the film thickness meter closed loop.

Optional RF plasma or ion source substrate cleaning

Optional Substrate Oxidation

System Safety Interlock

Computer controlled fully automatic or manual operation

Typical applications

For thin film deposition R & D

Ideal platform for LIFT-OFF process

Evaporatable metal, semiconductor or dielectric materials

evaporable magnetic material

Multi-source co-evaporation

Main Configuration

evaporation chamber	304 stainless steel, front door with viewing window
Vacuum pump	Evaporation chamber equipped with molecular pump or condensate pump and oil-free mechanical pump
Vacuum valve	Pneumatically controlled high vacuum valve
Vacuum measurement	Wide range vacuum gauge for measuring vacuum and rough draw gauge
evaporation source	Three (four or six) electron beam evaporation sources
Sample table	Rotation substrate table Selectable Tilt and Rotary Substrate Table (Optional heating to 600 ℃) (Optional cooling to -150 ℃)
Film thickness detection	Crystal Oscillator Rate Film Thickness Monitoring
Pre-vacuum sample chamber	Single or multiple substrate loading capability

Main technical indicators

ultimate vacuum degree	3E-8Torr
Substrate Size	Optional: 2 inches, 4 inches, 6 inches, 8 inches, 12 inches
film thickness uniformity	Better than +/-3%
Evaporation rate resolution	0.01 A/s
Film thickness resolution	0.1A