DE700PVD
Features |
|
Main Configuration
sputtering chamber | 304 stainless steel, rubber ring sealing door with viewing window |
Vacuum pump |
Molecular pumps (or condensate pumps) and dry pumps |
Vacuum valve | High vacuum plug-in valve, cavity inflation valve, roughing or pre-stage valve, gas control valve |
Vacuum measurement |
Wide range vacuum gauge and Pirani rough gauge |
sputtering source |
multiple magnetron sputtering cathodes DC, Pulse DC, RF, HIPIMS Power |
Substrate table |
The substrate can be rotated, optionally heated or cooled |
Pressure control |
Multi-gas flow meter and pressure gauge, PID sputtering pressure control |
Optional film monitoring |
Crystal film thickness/rate monitoring |
Optional pre-vacuum chamber |
Stainless steel cavity with observation window, automatic substrate transfer |
Safety interlock |
Sputtering source and whole system safety interlock protection |
Main technical indicators of coating room
Ultimate vacuum pressure |
<9E-8Torr |
Substrate Size |
Optional: 3 inches, 4 inches, 6 inches, 8 inches, 12 inches |
Optional substrate heating |
600℃ |
film thickness uniformity within the sheet |
≤ +/-3% |
Intersheet film thickness repeatability |
≤ +/-2% |
Loading capacity
Substrate Size | 3" | 4" | 6" | 8" | 8" | 12" |
Number of substrates | 24 | 18 | 15 | 4 | 9 | 4 |
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